抗高氟化
PTFE内衬
超纯
零泄漏
Semiconductor & Electronics
HF acid (hydrofluoric) is extremely corrosive to all metals Metal ion contamination can destroy wafer yield CMP slurry contains abrasive particles that destroy seals Zero particle shedding required for ultra-pu
Key Challenges
HF acid (hydrofluoric) is extremely corrosive to all metals
Metal ion contamination can destroy wafer yield
CMP slurry contains abrasive particles that destroy seals
Zero particle shedding required for ultra-pure water systems